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热发射扫描电镜技术规格及要求(Technical specifications and requirements for thermal emission scanning electron microscopy (SEM))

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热发射扫描电镜技术规格及要求(Technical specifications and requirements for thermal emission scanning electron microscopy (SEM))热发射扫描电镜技术规格及要求(Technical specifications and requirements for thermal emission scanning electron microscopy (SEM)) 热发射扫描电镜技术规格及要求(Technical specifications and requirements for thermal emission scanning electron microscopy (SEM)) Technical specifications and...

热发射扫描电镜技术规格及要求(Technical specifications and requirements for thermal emission scanning electron microscopy (SEM))
热发射扫描电镜技术规格及 要求 对教师党员的评价套管和固井爆破片与爆破装置仓库管理基本要求三甲医院都需要复审吗 (Technical specifications and requirements for thermal emission scanning electron microscopy (SEM)) 热发射扫描电镜技术规格及要求(Technical specifications and requirements for thermal emission scanning electron microscopy (SEM)) Technical specifications and requirements for thermal emission scanning electron microscopy (SEM) 1, equipment composition, layout and instructions 1.1 equipment name: thermal emission scanning electron microscope 1.2 quantity: a set The 1.3 field emission scanning electron microscope is mainly composed of the following parts: Host: thermal field emission scanning electron microscope Annex: electric refrigeration spectrum (EDS) and EBSD integrated system; ion beam coating instrument; precision cutting machine; semi-automatic grinding / polishing machine; vibration polishing machine. 1.4, recommended layout: open layout. 1.5. electron microscopy is mainly used to observe the micro morphology of materials and requires the device to be directly conductive (gold) Metal materials, semiconductor materials) and non-conductive materials (plastics, ceramics, glass etc.) were observed, in order to meet the research demand analysis and approximate observation of original state related samples; with EDS analysis, qualitative and quantitative distribution analysis and elemental line scanning and surface micro area composition of materials; with EBSD, the real-time acquisition of backscattered electron and calibration of electron back scatter diffraction, quick access by crystallographic structure information, analysis of crystal orientation, research materials and microtexture related material properties etc.. 1.6. can realize automatic detection through program control. 2, technical requirements 2.1. field emission scanning electron microscope FESEM Field emission scanning electron microscope (SEM), as the most critical component, requires the use of internationally renowned brand products. The bid document shall give a detailed description of the brand, characteristics and technical specifications of the selected field emission microscope. One performance parameter One point one Resolving power Two electron image (SE) 15KV 1nm 1KV 1.6nm Analysis mode (EDS or EBSD analysis) 15KV 3nm Backscattered electron image (BSE) 30KV 2.5nm One point two Magnification 30-800000 x Magnification error Less than or equal to 3% adjust Automatic magnification correction function, magnification preset function, continuous adjustable One point three Accelerating voltage 0.2-30KV adjust Continuously adjustable One point four Probe current (beam range) 4pA-100nA Stability Superior to 0.2%/h adjust Continuously adjustable One point five Imaging mode Two electron image; backscattered electron image Regulation model The two electron and backscattered electron imaging system can be mixed at any rate to automatically adjust and manually adjust brightness and contrast Two Electron optical system Two point one Electron gun (filament) The bidding document shall describe in detail the characteristics of the electronic optics system of the product The utility model has the function of automatically neutralizing and starting an electronic gun; displaying the status information of all the transmitter parameters in the display; the filament life is better than two years. Two point two Lens control system The lens control system shall be described in detail on the tender; the high resolution of the size sample is achieved. Instead of mechanical adjustable diaphragm, avoid mechanical errors and man-made misoperation. Two point three Objective aperture The light bar of the objective lens should be self - heating and self - cleaning. The lens diaphragm can be replaced without removing the lens barrel; the aperture life is better than two years. Two point four Beam displacement Scanning rotation, dynamic focusing and tilt correction are added, the rotation of the image is adjusted continuously, the working distance is changed, and the rotation compensation is automatically compensated. The sample is tilted automatically and corrected. Three Sample Room Three point one Sample stand Five axis drive motor, while retaining the manual shaft, moving range: X = 50mm; Y = 50mm; Z = 25mm; T = -5 ~ +70 ~ R=360 degree; continuous rotation, computer control of rotary control, built-in sample anti-collision alarm Three point two Sample Room Maximum loading diameter of not less than 150mm samples; compatibility high, reserved for EDS, EBSD and other standard expansion interface. Three point three Repeatability Repeatability: 2 m; Three point four stability Minimum step size: 90 nm; drift: after stable 20min, within 360 s (sample stage is not tilted), sample stage drift is less than 40 nm; Three point five Sample stage control Sample: in the mobile graphics on the screen with the mouse control and joystick control sensitivity; coordinate with magnification; sample platform navigation: moving from simulated samples Taiwan Smart SEM graphics; contact alarm: along with the information on the screen of the audio alarm. Four detector Four One One of the two electronic detectors in the barrel is one of each and one of the backscattered electron detectors; the sample chamber, the two electron detector, and one of the backscattered electron detectors Four point two Sample room, infrared CCD camera, one Five Computer control, digital image recording system and standard application software Five point one Configure data connection channels with EDS and EBDS; Five point two Has the function of automatic control, automatic vacuum control, automatic adjustment of the saturation current, lens aperture on, automatic focusing, automatic bias compensation, accelerating voltage of electron beam current automatic adjustment, automatic adjustment of scanning speed (according to SNR), automatically adjust the brightness, contrast & automatic astigmatism. Five point three Image processing: the maximum pixel is not less than 4096 * 3536 pixels. Image display: single image display or 4 images (SE and BSE, mixed like, like CCD) also showed that the double screen display (display parameters of the SEM); image recording: TIFF, BMP or JPEG; real-time measurement of geometric quantities (any magnification error less than 3%); the standard equipped with a variety of measurement tools access and management software; software image; operating software built-in help software, help users to query the relevant procedure; control and other products with standard data processing Matching function. Five point four Electronic microscope control operation software. Six Control and data processing system Six point one A data transmission system based on Ethernet architecture; Intel dual core control and operation computer systems (requiring bids to be explicitly configured); Windows XP operating system; central processing unit; CPU:Intel; P4 3.2GHz. Memory: 3.45G: external interface: serial, parallel, SCSI, USB 2 interface, network; hard disk 1000GB; CD, DVD burn; display: 19 inches LCD display (bidding documents should be clear manufacturers and models) Seven vacuum system Seven point one The turbo molecular pump, ion pump, the mechanical pump; sampling time: less than 300 seconds (high vacuum); electron gun vacuum level of 10-7Pa; high vacuum chamber vacuum mode 10-4Pa magnitude. Eight Working conditions and installation requirements Eight point one Power supply: 220V/50Hz; operating environment temperature: 15-25 degrees; operating environment: relative humidity <80%; instrument operation durability: continuous operation; Eight point two It can be installed on the first floor of testing center of Wuhan University of Technology, and ensure the acceptance target of equipment. Nine Safeguard Nine point one With sudden vacuum drop, water break, power failure, ground fault automatic protection Ten Cooling system Ten point one Equipped with circulating water cooler Eleven Other accessories or wearing parts Eleven point one Configuration of accessories or wearing parts (spare filament + diaphragm 3 sets, including technical personnel service and travel expenses). 2.2. accessories: electrical refrigeration spectrometer (EDS) and EBSD integrated system The attachment is the key accessory equipment of field emission scanning electron microscope (SEM) for the analysis of microstructure of materials. EDS One detector One point one (*) chip type * Silicon drift SDD electronic refrigeration probe (Silicon, Drift, Detector), independent package FET FET, round silicon drift crystal, ultra thin window design. The independent vacuum consumes only electric energy, and does not require circulating water and other vacuum pumps or fans to refrigerate without vibration. One point two (*) effective detection area * Not less than 30mm2, under the same conditions, greatly increase the count rate. With field emission SEM operating at low voltage, the signal intensity and spatial resolution of the spectrum can be significantly improved One point three (*) energy resolution * (Mn-Ka) measurement is superior to 131V under 100000CPS conditions; Light prime resolution: C-K is better than 52eV One point four Maximum input (output) count The spectrometer, processor and computer adopt discrete design, and communicate with 1394 cards. The maximum input count is not less than 850000cps, the maximum output count rate is greater than 300000CPS, the maximum count rate can be handled greater than 700000CPS One point five Window type Slim probe window One point six Range of elemental analysis * Be4~U92 One point seven Peak back ratio Superior to 15000:1 One point eight Spectral stability The peak shift of 1000cps to 100000cps, Mn and Ka peaks is less than 1eV, the resolution is less than 1eV, and the peak shift is less than 1.5eV within 48 hours. One Ten Boot speed With Ling Feng correction function, you can quickly and steadily peak spectrum, boot 5 minutes to get a stable quantitative results. 1.11 The design of electron trap without leakage has no influence on the scanning electron microscope Two (*) spectrum application software Manufacturers need to reflect in detail the characteristics of the product software in the bidding documents: energy spectrum application software, based on Windows 7 platform, using multi tasking design, can simultaneously parallel several tasks, and support split screen display and remote control. Navigation device interface design, simple operation, friendly interface, and has Chinese and English interface, you can freely switch; qualitative analysis: the automatic identification of peak, in addition to inert elements, no prohibition of automatic calibration of spectral element; reconstruction of hand stripping peak overlapping peaks; quantitative analysis by XPP quantitative correction technique and high digital filtering technology to tilt sample correction, and enhance the correction of the light element; with a complete virtual sample library; with a standard quantitative analysis and standard method for quantitative analysis; can be normalized and non normalized quantitative results can be used by non coordination chemistry normalized results; other features: with the full spectrum of intelligent distribution / line scan analysis function, a collection, can be stored in each scanning position (x, y) of all the elements of the information, the user can follow from The line spectrum, line scan and face distribution map are reconstructed from any position of the image in line state. The resolution of the whole spectrum is 4096*4096. Other features: 8192*8192. electronic image resolution can be transmitted to the electron microscope image spectrometer on the display, and the graph is analyzed in micro area, can display the size of electronic effect area of point, rectangle, polygon, analysis of arbitrary irregular region; the experiment reports: a variety of output formats, single can generate Word documents, and HTML format; off-line data processing software; software features to provide products with tender function. Three Computer and its accessories Pentium 4, clocked 3.0G, 2G, Hz memory, 500G HD, DVD-RW, 22 LCD, network card EBSD One EBSD detector One point one (*) EBSD probe * Suitable for high-speed EBSD detector in field emission scanning electron microscope, can be used in conjunction with EDS hardware, high sensitivity CCD high-end camera, the accelerating voltage is greater than 3KV, and the beam is greater than 500pA, which can collect the obvious diffraction pattern. 40 x 30mm large rectangular screen pattern; pixel resolution: 640 x 480 x 12 bit high precision motor drive; ensure that the vacuum sealing with scanning electron microscope; safety protection device; configuration; scattering detector (FSD) can fully close to the sample without obscuring spectral probe, without electronic cooling, CCD camera installed directly on the screen, sufficiently close to the sample. One point two (*) pattern acquisition speed; More than 106 points / sec (8*8 binning) One point three Calibration success rate At any scan rate, the calibration success rate of >99% was measured using polycrystalline nickel (Ni) as a standard. One point four (*) accuracy of orientation At any scanning speed, the alignment accuracy is better than 0.3 degrees, and the quantitative index of data availability is given simultaneously; Two (*) database systems With dedicated EBSD and ICSD databases, it has the ability to manually build databases and add generic database capabilities derived from XRD. Three (*) software function With the combined use of energy spectrum, with the image acquisition system has the function of SEM imaging, SEM can support a variety of image type, image size not less than 4096 * 4096; with EBSD pattern free sample collection, automatic calibration function system, with pole figures and inverse pole figure, orientation distribution, separation and identification, to analysis of the grain boundary texture analysis of EDS and EBSD, as well as synchronization, offline data processing software package; software to provide products with characteristics of bid function. Four (I) computer Provide communications connections and high performance computer workstations to ensure high resolution; the bid features detailed product features. 2.3. accessories: ion beam coating instrument Function: it is suitable for spraying the conductive layer on the surface of different materials. Main technical indexes: One The sample can be rapidly coated with only minimal heat; 2. control sample rotation and swing rate to ensure uniform film deposition; 3. sample stands are suitable for all kinds of SEM samples; 4. equipped with film thickness gauge (FTM), continuous deposition rate can be measured; 5. provide a variety of materials (C, Pt, Au, Cr) target; 6. the rake material hidden in the cavity is completely isolated from the sputtering contaminant; 7., you can choose second rake material exchange instrument, you can add two rake material, but in the case of vacuum, in a very short time to choose two available rake material any one. 2.4. accessories: precision cutting machine Function: suitable for sampling of different materials, including ceramic, metal, rare earth materials, composite materials, biological materials, etc.; can automatically complete the sample cutting, and has good cutting effect, small sample damage; failure analysis for sample can accurately cutting. Main technical indexes: 1. working power: 1/8 HP (92 Watt) DC motor 2. blade speed: 0-975 RPM continuously adjustable, step 1RPM 3. blade size: 75mm (3 inches) -178mm (7 inches) 4. mounting hole size: 1/2 "(12.7 mm) 5. max. cutting diameter: 40 mm 6. automatic cutting switch, sliding chip balance system (0-500g) 7. digital sample positioning system, positioning accuracy 0.1mm 8. with removable protective cover, it can be automatically closed cutting 9. internal cutting disc finishing device The 10. standard configuration contains all connections, pipelines, appliances, and operation manuals 11. supplies, configuration coolant (950ml) and diamond blade (152x0.50x12.7). 12. working environment: 220V/ single phase 2.5. accessories: semi-automatic grinding / polishing machine Function: through the use of different grinding / polishing medium, complete from coarse grinding to fine throwing sample preparation process Main technical indexes: 13. grinding power: 750 watts 14. automatic work head power: 116 watts 15. disc diameter: 250mm 16. chassis speed: 10-500 revolutions per minute, adjustable rotation direction 17. automatic working head speed: 30-60 RPM / min, steering can be adjusted to increase cutting speed when necessary 18. pressure mode: two modes of single point force (5-45 Newton) and intermediate force (20-260 Newton) 19. touch panel control 20. water outlet, water outlet size / direction can be adjusted 21. safety performance: emergency stop knob; 22. all fixtures can be conveniently and quickly assembled or disassembled with the work head to meet frequent cleaning and microscopic observation requirements 23. pneumatic pressure control, stable and safe 24. panel control: pressure mode, pressure size, work head, steering, working time, flow switch 25. dimensions and equipment weight: 506 X621X653mm, 175 pounds (85KG) 26. working environment: 220V/50Hz, air pressure 85psi (6bars), clean tap water 2.6. accessories: vibration polishing machine Function: finish the vibration polishing of the metallographic sample, the residual stress is small, suitable for EBSD sample preparation Main technical indexes: 1. flip discs with diameter 12 "(305mm) 2. maximum vibration frequency 7200 times per second 3. vibration amplitude can be adjusted and displayed on the panel with LED light beam 4. provide 100% horizontal vibration without vertical vibration, and can produce high quality smooth surface 5. at most 18 samples can be polished at one time 6. corrosion resistant polishing warehouse 7. touch panel control 8. working environment: 220V/50HZ/ single-phase inlet / outlet
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